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Dr. Michael Reinke

Location: Basel, Switzerland
Cell: +41 76 23 10 487
E-mail (professional):
E-mail (private):

I am a young physicist with a strong background in materials science and thin film deposition techniques.
After 6 years of scientific work and 8 years of self-employment, I have accumulated both a scientific as well as a strong business oriented expertise.

Occupation

BASF SwitzerlandResearch Scientist, since 2016

I am working in the department "New Business Development"; very interesting but also quite confidential... more to come later.

Swiss Federal Laboratories for Materials Science
and Technology (Empa)Doctoral Assistant, 2011-2015

I am responsible for a prototype high vacuum chemical vapor deposition reactor, which I am using for thin film deposition of electro-optic materials. Furthermore I investigate surface kinetics of conventional chemical vapor deposition and atomic layer deposition.

University of Hamburg, Germany Junior Researcher, 2011

I was responsible for the planning and realization of a high harmonic source for ultrashort UV-laser pulses.

Brücke SH, gGmbH, Kiel, Germany IT Consultant and Docent, 2005-2011

I organized the IT hardware and software for 100 employees and instructed employees and clients in basic computer usage.

Self-Employed, Hamburg, Germany Web-Developer, 2002-2010

I acquired projects, programmed web applications and back-end database administration using HTML, CSS, Ajax, PHP and MySQL.

Skills

Professional Skills

Thin Film deposition (CVD, ALD and PVD techniques) and characterization (SEM, EDX, FIB, XRD, AFM, XPS, Spectroscopic Ellipsometry), Microfabrication (photo- and e-beam lithography), High Vacuum, Optics, Ultrafast Physics, Ultrashort Laser Pulses, Synchrotron Facilities

Language Skills

  • German: native language
  • English: excellent Fluency (working language)
  • French: good practical knowledge
Education

École Polytechnique Fédérale de Lausanne (EPFL), Switzerland

PhD student, 2011-2015

Major: Photonics & Materials Science

I worked on the analysis of surface kinetics during the chemical vapor deposition and atomic Iayer deposition of titanium dioxide using titanium tetraisopropoxide and water. Furthermore, I have developed processes for the epitaxial growth of electro-optic materials (barium titanate) at CMOS compatible substrate temperatures.

University of Hamburg, Germany Undergraduate Student, 2005-2011

Major: Physics, Minor: Biophysics, Philosophy

During my thesis, I realized an experimental setup for time resolved electron spectroscopy utilizing a femtosecond laser driven kα X-ray source.

Public Policy

Photonics Doctoral School, EPFL Student Representative, 2013-2015

I represent around 100 PhD candidates of the photonics doctoral school during doctoral school commission meetings.

EPFL Photonic Chapter Founder & President, 2011-2014

I was responsible for foundation, organization of events, recruiting of members and representation at international events.

Conference Organizations 2013

  • I was local coordinator of the organizing team for the organization of the 13th International OSA Network of Students conference, which hosted over 100 international graduate students in Switzerland.
  • Furthermore I participated in the organization of the graduate student symposium at Empa as responsible for finances and sponsoring (92 participants).
Honors & Awards

FinalistSwitzerland, 2015

"My Thesis in 180 Seconds" contest at EPFL.

Best PresentationSwitzerland, 2015

1st price for the best oral contribution at EuroCVD 20 Conference.

Best Oral ContributionLuxembourg, 2014

1st price for the best oral contribution at the 1st Belux workshop on Coating, Materials, Surfaces and Interfaces.

Presentation AwardSwitzerland, 2014

3rd price for the best presentation at the Empa PhD Symposium 2014.

Best MicropresentationSwitzerland, 2013

1st price for the best presentation at the International OSA Network of Students Conference.

Teaching Activities

Surface ChemistryEPFL, 2012-2015

I was responsible for the content organization of the course and supervising the exercises.

Mathematics, Analysis I - III Uni. Hamburg, 2007-2009

I was leader of an exercise session, setting up exercises, correcting them and presented them to the students.

Docent for Windows & OfficeBrücke SH, 2005-2011

I was teaching the all-day use of Microsoft Windows and Office products to adults and adolescents, which are temporarily in psychological care.

Scientific Publications
  • Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition

    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, The Journal of Physical Chemistry C, 2016, 120 (8)

  • Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition

    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, The Journal of Physical Chemistry C, 2015, 119 (50)

  • Combinatorial CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, physica status solidi (a), 2015, 212 (7), Pages 1556–1562

  • Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide

    Michael Reinke, Evgeniy Ponomarev, Yury Kuzminykh, Patrik Hoffmann, ACS Comb. Sci., Article ASAP, DOI: 10.1021/acscombsci.5b00040

  • Selective Growth of Titanium Dioxide by Low Temperature Chemical Vapor Deposition

    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, ACS Applied Materials & Interfaces, 2015, 7 (18), Pages 9736–9743

  • Low Temperature Chemical Vapor Deposition Using Atomic Layer Deposition Chemistry

    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, Chemistry of Materials, Volume 27, Issue 5 (2015), Pages 1604-1611

  • Limitations of Patterning Thin Films by Shadow Mask High Vacuum Chemical Vapor Deposition

    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, Thin Solid Films, Volume 562 (2014), Pages 56-61

  • High Vacuum Chemical Vapour Deposition of Oxides: A Review of Technique Development and Precursor Selection

    Yury Kuzminykh, Ali Dabirian, Michael Reinke, Patrik Hoffmann, Surface and Coatings Technology, Volume 230, 15 September 2013, Pages 13-21

  • Precursor Adsorption Efficiency of Titanium Tetra Isopropoxide in the Presence of a Barium β-diketonate Precursor

    Michael Reinke, Yury Kuzminykh, Graziella Malandrino, Patrik Hoffmann, Surface and Coatings Technology, Volume 230, 15 September 2013, Pages 297-304

Conference Contributions

2015

  • Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, 15th International Conference on Atomic Layer Deposition, USA (Portland), June 2015 – Oral Presentation
  • Low Temperature Chemical Vapor Deposition Using Atomic Layer Deposition Chemistry
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, EuroCVD 20, Sempach, Switzerland – Oral Presentation
  • Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, EuroCVD 20, Sempach, Switzerland – Oral Presentation
  • Combinatorial High Vacuum CVD of Barium Tri-Isopropyl Cyclopentadienyl and Titanium Tetra-Isopropoxide
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, EuroCVD 20, Sempach, Switzerland – Poster Presentation
  • Selective Area High Vacuum Chemical Vapor Deposition of Titania on Functionalized Surfaces
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, EuroCVD 20, Sempach, Switzerland – Poster Presentation
  • Surface Kinetics of TiO2 Deposition Using Titanium Tetraisopropoxide and Water
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, RAF ALD Meeting, Grenoble, France – Oral Presentation
  • CMOS Compatible Epitaxial Barium Titanate Deposition by High Vacuum Chemical Vapor Deposition
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, MRS Fall Meeting 2015, Boston, USA – Oral Presentation

2014

  • Full Wafer TiO2 Deposition by Simultaneous Exposure with Titanium (IV) Isopropoxide and Water within the ALD Window in a High Vacuum CVD Reactor
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, 14th International Conference on Atomic Layer Deposition, Japan (Kyoto), June 2014 – Oral Presentation
  • Surface Kinetics of Titanium (IV) Tetraisopropoxide Studied by Combinatorial High Vacuum Chemical Vapor Deposition
    Michael Reinke, Evgeniy Ponomarev, Yury Kuzminkyh, Patrik Hoffmann, 17th International Conference on Metalorganic Vapor Phase Epitaxy, Switzerland (Lausanne), July 2014 – Poster Presentation
  • Selective Area High Vacuum Chemical Vapor Deposition of TiO2 on Functionalized Surfaces below Pyrolytic Decomposition Temperatures
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, 1st Belux workshop on Coating, Materials, Surfaces and Interfaces, Luxembourg (Belvaux), September 2014 – Oral Presentation
  • Selective Area High Vacuum Chemical Vapor Deposition of TiO2 on Functionalized Surfaces below Pyrolytic Decomposition Temperatures
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, Micro and Nano Engineering, Switzerland(Lausanne), September 2014 – Oral Presentation
  • Selective Area High Vacuum Chemical Vapor Deposition of TiO2 on Functionalized Surfaces below Pyrolytic Decomposition Temperatures
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, Empa PhD Symposium 2014, Switzerland(St. Gallen), October 2014 – Oral Presentation

2013

  • Deposition of Electro-Optic Materials by High Vacuum Chemical Vapor Deposition
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, IONS 13, Zürich and Lausanne, Switzerland – Oral and poster presentation
  • Structuring Thin Films by Hard Masks Utilizing High Vacuum Chemical Vapour Deposition
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, E-MRS Spring Meeting, Strasbourg, France – Oral Presentation
  • Titanium Tetra-Isopropoxide Decomposition Performance in the Presence of a β-Diketonate Precursor
    Michael Reinke, Yury Kuzminykh, Graziella Malandrino, Patrik Hoffmann, EuroCVD 19, Varna Bulgaria – Oral Presentation
  • High Vacuum Chemical Vapor Deposition Of Oxides: A Review
    Yury Kuzminykh, Ali Dabirian, Michael Reinke, Patrik Hoffmann, EuroCVD 19, Varna Bulgaria – Oral Presentation
  • Limitations of Geometrically Controlled Growth of TiO2 Films by Hard Shadow Mask HV-CVD
    Michael Reinke, Yury Kuzminykh, Patrik Hoffmann, EuroCVD 19, Varna Bulgaria – Poster Presentation
  • Complex Decomposition Behaviour of Cu(tmhd)2 in High Vacuum CVD Process : Combinatorial Co-Deposition with Ti-Isopropoxide
    Yury Kuzminykh, Michael Reinke, Silviu Cosmin Sandu, Giacomo Benvenuti, Patrik Hoffmann, EuroCVD 19, Varna Bulgaria – Poster Presentation

2012

  • Deposition of Oxide Films by High Vacuum Chemical Vapor Deposition
    Michael Reinke, Ali Dabirian, Xavier Multone, Yury Kuzminykh, Patrik Hoffmann, EMRS Spring Meeting, Strasbourg, France - Poster presentation
  • High Vacuum Chemical Vapor Deposition of Epitaxial Lithium Niobate for Integrated Photonics Application
    Yury Kuzminykh, Ali Dabirian, Michael Reinke, Patrik Hoffmann, EMRS Spring Meeting, Strasbourg, France - Oral presentation
  • Deposition of Oxide Films by High Vacuum Chemical Vapor Deposition
    Michael Reinke, Ali Dabirian, Yury Kuzminykh, Patrik Hoffmann, Junior Euromat (FEMS), Lausanne, Switzerland - Oral and poster presentation
  • Deposition of Optical Thin Films for Electro-Optic Modulators by Chemical Beam Deposition
    Michael Reinke, Ali Dabirian, Yury Kuzminykh, Patrik Hoffmann, Besancon Photonic Days, Besancon, France – Invited oral presentation